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| | Saurabh
Lodha
Contact Information
Email:
lodha@ecn.purdue.edu
Phone: 765-494-3494
Personal Webpage
http://min.ecn.purdue.edu/~lodha
Academics and Research
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Doctoral student (Aug. 2001-present), ECE
Dept., Purdue University.
Advisor- Prof. David B. Janes
Project- Currently working on two and three terminal device structures
using thin, bulk-like molecular layers. Molecules using nitro and/or amino
groups are being studied. The project invloves characterization (ellipsometry, UV/IR spectroscopy, STM imaging) of thermally evaporated
molecular layers and electrical characterization (I-V, dI/dV, I-T
measurements) of the device structures. Organic thin film transistor
structures utilizing molecules such as pentacene and napthacene will also
be studied.
Masters in ECE (Aug. 1999-Dec. 2001), ECE Dept., Purdue University.
Advisor- Prof. David B. Janes |
Thesis- Experimental and modeling studies of
Schottky contacts to low-temeprature-grown GaAs
This work is a study of Fermi level pinning in Schottky contacts on MBE
grown n-GaAs, with and without an as-grown intrinsic or a Be-doped-LTG:GaAs surface
layer. Ex-situ, non-alloyed Schottky contacts
were fabricated using Ni, Ti and Mg for short air exposure times. High
frequency C-V measurements and Poisson simulations incorporating a
complete description of the defect states in the LTG:GaAs interface layer
were used to extract the interface barrier height. The results indicate
that unlike n-GaAs, the Fermi level is highly unpinned for metal-LTG:GaAs
interfaces because of a significant "extrinsic" reduction in interface
state density. I-V and I-T measurements were used to verify the accuracy
of the C-V technique.
Publications:
1) S. Lodha, D. B. Janes, and N.-P. Chen, "Fermi
level unpinning in ex-situ Schottky contacts on n-GaAs capped with low-temperature-grown
GaAs," Appl. Phys. Lett., (to appear).
2) S. Lodha, D. B. Janes, N.-P. Chen, and E. H. Chen, "Unpinned interface
Fermi level in Schottky contacts to n-GaAs capped with
low-temperature-grown GaAs; experiments and modeling using defect state
distributions," J. Vac. Sci. Technol. B, (submitted).
This work has also been presented at the 43rd Electronic Materials
Conference (Notre Dame, June 2001) and at the 29th Conference on the Physics and Chemistry of Semiconductor Interfaces (Santa Fe, Jan. 2002).
 | Bachelor of Technology, (May 1995-Aug. 1999),
EE Dept., Indian Institute
of Technology, Bombay, India.
Advisor- Prof. Juzer Vasi
Thesis- Radiation and reverse bias stressing
damage in Si-SiGe HBTs and Si
BJTs
Publications:1) A. Topkar, S. Lodha, et al., "Ionizing radiation induced
degradation of
SiGe HBTs," Proceedings of the 10th Intl. Workshop on Physics
ofSemiconductor Devices, pp. 659-662, New Delhi, 1999.
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